Basic aspects of deep lithography with particles for the fabrication of micro-optical and micro-mechanical structures
Collection editors:
van Daele, Peter; Mohr, Jürgen
Title of conference publication:
Micro-Optics
Subtitle of conference publication:
Fabrication, Packaging, and Integration
Series title:
SPIE Proceedings
Series volume:
5454
Issue:
52
Organizer (entity):
SPIE
Conference title:
Photonics Europe
Venue:
Strasbourg, France
Year of conference:
2004
Publisher:
SPIE
Year:
2004
Pages from - to:
52-63
Language:
Englisch
Keywords:
Aspect ratio ; Composite micromechanics ; Computer software ; Fabrication ; Micromachining ; Microoptics ; Microstructure ; Optical systems ; Deep lithography ; Dose simulations ; Ion stopping ; Optical surface profiles, Photolithography
Abstract:
The strength of today's deep lithographic micro-machining technologies is their ability to fabricate monolithic building-blocks including optical and mechanical functionalities that can be precisely integrated in more complex photonic systems. In this contribution we present the physical aspects of Deep Lithography with ion Particles (DLP). We investigate the impact of the ion mass, energy and fluence on the developed surface profile to find the optimized irradiation conditions for different types of high aspect ratio micro-optical structures. To this aim, we develop a software program that combines the atomic interaction effects with the macroscopic beam specifications. We illustrate the correctness of our simulations with experimental data that we obtained in a collaboration established between the accelerator facilities at TUM, LNS and VUB. Finally, we review our findings and discuss the strengths and weaknesses of DLP with respect to Deep Lithography with X-rays (LIGA). «
The strength of today's deep lithographic micro-machining technologies is their ability to fabricate monolithic building-blocks including optical and mechanical functionalities that can be precisely integrated in more complex photonic systems. In this contribution we present the physical aspects of Deep Lithography with ion Particles (DLP). We investigate the impact of the ion mass, energy and fluence on the developed surface profile to find the optimized irradiation conditions for different typ... »