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Document type:
Zeitschriftenartikel / Journal Article
Title:
Physical characterization of mixed HfAlOx layers by complementary analysis techniques
Collection editors:
Dimoulas, A.; Fompeyrine, J.; Fanciulli, M.; Alexe, M.; Os, H. J.
Journal:
Materials Science and Engineering B
Volume:
109
Issue:
1-3
Year:
2004
Pages from - to:
60-63
Language:
Englisch
Keywords:
Composition ; Density measurement (specific gravity) ; Deposition ; Dielectric materials ; Ellipsometry ; Infrared spectroscopy ; Permittivity ; Rutherford backscattering spectroscopy ; Secondary ion mass spectrometry ; Silicon wafers ; Thermooxidation ; Thickness measurement ; Transmission electron microscopy ; Vacuum ; X ray photoelectron spectroscopy, Atomic layer deposition (ALD) ; HfAlOx ; High-κ dielectrics ; Physical characterization ; Hafnium compounds
Abstract:
The combined information of complementary physical analysis techniques is applied to obtain a full characterisation of the important material parameters of new high-k layers, i.e. the layer thickness, density, composition and interlayer thickness and nature, and to optimise the measurement methodologies of the different techniques.
ISSN:
0921-5107
Department:
Fakultät für Luft- und Raumfahrttechnik
Institute:
LRT 2 - Institut für angewandte Physik und Messtechnik
Chair:
Dollinger, Günther
Open Access yes or no?:
Nein / No
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