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Authors:
Mariazzi, S.; Dinoto, L.; Ravelli, Luca; Egger, Werner; Brusa, R. S. 
Document type:
Zeitschriftenartikel / Journal Article 
Title:
Study of Positronium formation in nano-channelled silicon as a function of sample temperature 
Journal:
Journal of Physics. Conference Series (JPCS) 
Volume:
443 
Issue:
Year:
2013 
Language:
Englisch 
Abstract:
Oxidized nanochannel in silicon have been demonstrated to be suitable for positronium (Ps) formation and cooling also at low sample temperature. To investigate the Ps yield and to clarify the Ps formation mechanism we studied, by Positron Annihilation Spectroscopy (PAS), nanochanneled Si p-type samples in the 150-430 K temperature range. Ps yield was found to be constant in the 150-300 K temperature range, then it increases up to ∼50 
ISSN:
1742-6588 
Article ID:
012061 
Department:
Fakultät für Luft- und Raumfahrttechnik 
Institute:
LRT 2 - Institut für angewandte Physik und Messtechnik 
Chair:
Dollinger, Günther